VIL Series Automatic Step-and-Repeat Interference Nanopatterning

Basic Information

The VIL 1000 nanopatterning system possesses powerful functions, such as fast reconfigurable beam delivery, active interference pattern stabilization, step-and-repeat exposure with precise sample positioning, etc. All the functions are fully automated through our proprietary user-friendly control software LithoPro. After a sample is loaded, no more manual setting or adjustment is needed. The system can produce various nanostructures, such as 1D grating lines and 2D pillar/hole patterns with periods from below 240 nm to over 1500 nm on up to 8-inch large area through repeated exposures using patterning fields of standard 2cm-by-2cm square or user-defined shapes. Each patterning field can contain nanostructures with independently set periodicity, lattice, and feature sizes. Optional modules are available for extended functions of integrated UV contact photolithography, patterned modulation of feature sizes, and lithographic process simulation.
The VIL 1000 is ideal for quickly producing devices with multiple different nanopatterned regions, such as AR displays. It is also useful for param

Application Direction

STEP-AND-REPEAT NANOPATTERNING

The standard VIL 1000 model supports step-and-repeat exposure on 4 wafers with an individual patterning area up to 2 * 2 cm2 Upgraded with the advanced sample positioning module, the patterning area can be extended up to 6 or 8 wafer scale.

AUTOMATIC PATTERN SETTING

The fully-motorized beam delivery module and sample positioning stage provide great flexibility in fabricating nanopatterns of various periodicities and geometries, including lines, pillars, holes,
checkerboards, rods, etc.

PATTERN SIZE MODULATION/ UV MASK EXPOSURE MODULE

The VIL 1000 can be upgraded with the pattern size modulation module for fine-tuning the filling ratio of 1D and 2D structures, further improving the pattern uniformity and producing arbitrarily designed spatial distribution of feature sizes. The
optional UV mask exposure module is also available, which is compatible with contact photolithography for a wider range of applications.

CORE TECHNIQUES

• INTERFERENCE LITHOGRAPHY (IL)
  
• FAST-RECONFIGURABLE BEAM DELIVERY
  
• ACTIVE INTERFERENCE PATTERN
• STABILIZATION (AIPS)
  
• PRECISION OPTOMECHANICS
  
• MULTI-AXIS SAMPLE POSITIONING

CORE TECHNIQUES

APPLICATON CASE STUDY

Patterned sapphire substrates (PSS) have been evolving towards smaller features at the nanoscale for further improving LED performance and exploring advanced LED products. The VIL 1000 is suitable for producing large-area nanostructures used in PSS.
 
Micro and nanostructured interfaces have been widely applied in microfluidics and biomedical applications due to the manipulation of liquid such as wetting, transportation, superhydrophobicity, etc. Our VIL 1000 is useful to fabricate large-area microfluidics and biochips to achieve high-responsiveness, low-cost, and lab-on-chip applications.

Diffractive waveguides are considered the most mature and promising augmented and mixed reality combiner technology. The VIL 1000 is a good fit to fabricate nanoscale gratings used in AR waveguides.