HIL Series Wafer-Scale Nanopatterning System

Basic Information

The HIL 1000 nanopatterning system features powerful functions such as single-shot wafer-scale nanopatterning capability, semi-automatic reconfigurable beam delivery, active interference pattern stabilization, etc. All these features are controlled by our proprietary user-friendly software
LithoPro. The system can produce sub-50-nm periodic nanostructures on a large area (up to 4-inch wafer, larger size feasible) within minutes with
one single exposure. Users can further reduce the feature sizes to sub-20 nm with additional nanofabrication processing protocols available from InterLitho. The wafer-scale exposure field can be patterned with versatile 1D or 2D nanostructures of deterministically set periodicity, lattice, and feature sizes. Optional modules are available for extended functions of patterned
modulation of feature sizes and lithographic process simulation. The HIL 1000 is ideal for manufacturing high-quality wafer-scale nanoimprint masters for R&D and mass production. Its also a highly productive tool for 
prototyping devices that demand large-area nanopatterns, especially when fast turnaround time is critical.

Basic Information

WAFER-SCALE NANOPATTERNING
Our standard HIL1000 model supports wafer-scale
nanopatterning on 3-inch wafers with one single exposure. With an upgrade option of our pattern size modulation module, the patterning area can be extended to 4 inches with higher uniformity.

HIGH-RESOLUTION PATTERNING

The HIL 1000 model is able to fabricate nanostructures with feature sizes below 50 nm. Photoresist patterns in the nanometer scale with rectangular profiles and high aspect ratios could benefit subsequent processes such as etching and
deposition.

SEMI-AUTOMATIC DIMENSION SETTING

The fast-reconfigurable beam delivery module and the motorized sample positioning stage provide great flexibility in fabricating nanopatterns of various dimensions and geometries,
including lines, pillars, holes, checkerboards, rods, etc.

PATTERN SIZE MODULATION

The upgradable pattern size modulation module can modify the filling ratio of 1D and 2D structures, further improving the pattern uniformity and producing arbitrarily designed spatial distribution of feature sizes

CORE TECHNIQUES

• INTERFERENCE LITHOGRAPHY (IL)
  
• FAST-RECONFIGURABLE BEAM DELIVERY
  
• ACTIVE INTERFERENCE PATTERN STABILIZATION (AIPS)
  
• PRECISION OPTOMECHANICS
• AUTOMATIC SAMPLE POSITIONING