The NTI-FE 1801 Field Emission Scanning Electron Microscope (FESEM) uses Schottky fieldemission electron gun (FEG) technology. Advanced full-column accelerating technology integrated into the electron optical column ensures outstanding imaging performance at low accelerating
voltages,enables high-resolution imaging of various materials. Multiple detectors system collects diverse electron signals emitted from thesample efficiently for imaging, revealing microscopic morphology and structural information of the sample to the maximum extent.
• Schottkyfield emission electron gun ensures beamstability and high imaging resolution.
• Full-column accelerating technology ensures highimaging
performance of the electron beam at lowaccelerating voltages.
• Compound lens design combines electrostatic andmagnetic fields. No magnetic fields leaks fromobjective lens, ensuring high quality imaging ofmagnetic samples.
• Simultaneous collection includes two typesof secondary electron, backscattered elec-tron, and transmitted electron signals.
• Simultaneous presentation of morphologicaland compositional contrast reveals thesamples microscopic morphology andcomposition information to the maximumextent.
• Modular design with an expandable system architecture.
• Customized solutions are available according to specific
application demands.
• Multiple ports compatible with various third-party accessories such as EDS, EBSD, WDS, CL, in-situ experimental device, etc., enabling both imaging and analysis.
• Inductively Coupled Plasma (ICP) technology to generates
plasma with much higher particle density than traditional
capacitively coupled technology.
• The high concentration of oxygen radicals generated can
efficiently remove surface hydrocarbon contami-nants on the
sample.
• "Downstream" cleaning method has no damage to the
sample and preserves the original surface morphology.
• Operating pressure range:0.01-500 Pa, will not damage the
high vacuum of electron microscope sample chamber.
• Integrated software control,one-button operation without
excessive user operation.
• Integrates Downstream plasma, ultravioletirradiation, and
heating vacuum detach-ment into one machine, cleaning
source can be switched at any time.
• Suitable for cleaning samples for various scanning electron
microscopes, focused on beam microscopes,and
transmission electron microscopes.
• High-resolution touch screen operation supports remote
control in WiFi environ-ment.
• Can be used as a constant temperature vacuum sample
storage cabinet.
• Hydrophilization treatmentsignificantly improves the
wettability.
• Efficiently removes surface hydrocarbon contaminants
from scanning/transmission electron microscope samples.
• The sample chamber can be pumped to high vacuum
forvacuum storage ofsamples.
• Inductively Coupled Plasma (lCP) cleaning source has
no pollution to the samples.
• High-resolution touch screen,one-button operation.