The SE-m is a dedicated spectral ellipsomemeter for the semiconductor industry's customized micro-pattern structure measurements, using 1 ultra-small spot detection measurement technology, 2 Customized ultra-fast measurement speedsand other technologies. It can be applied to the n/k/d measurement of thin films such as anti-reflection coatings and conductive films on various transparent substrates, and is perfectly suitable for the analysis of various optical parameters of micro-area patterns.
It is applied to the measurement of optical constants, and is perfectly suitable for all kinds of coating inspection applications such as optical thin films.
• Spot size can be customized, the minimum can be up to 30um;
• Ultra-fast measurement, single measurement time is less than 0.5 seconds;
• The series configuration is flexible, and it supports customized design of functions;
• Compact structure, more suitable for online integrated measurement.