Product Overview
The Leading Nanometrology Tool for Failure Analysis
Park NX20 is the go-to solution for failure analysis and semiconductor metrology. It offers accurate, precise, and reproducible measurements, featuring a non-contact mode for preserving tip sharpness, fast defect imaging, and a decoupled XY scanning system for 3D measurements. The low-noise Z detector ensures precise topography measurements without errors during high-speed scanning. With capabilities for surface roughness measurements, defect review imaging, high-resolution electrical scans, and sidewall measurements, Park NX20 excels in tackling intricate semiconductor challenges and large-sample research.
Basic Information
Defect Review Imaging and Analysis for Large Sample
Park NX20 is equipped with unique features that make it easier to uncover the reasons behind device failure and develop more creative solutions. Its unparalleled precision provides high resolution data that lets you focus on your work, while its True Non-Contact mode scan keeps tips sharper and longer. Park NX20 has one of the most user friendly designs and automated interfaces in the industry, so you wont have to spend as much time and energy using the tool and supervising junior engineers with the system. This lets you focus your experience on solving bigger problems and providing insightful and timely failure analysis to your customers.
Key Features