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Nanoimprint lithography (NIL) has unmatchable advantages over the existing nanopatterning technology. As soon as it was invented, was quickly applied to a broad range of disciplines, including microlens arrays, AR glasses, VR headsets, displays, biotechnology, semiconductor integrated circuits, and advanced materials, to name just a few. Prinano Technology has developed NIL machines for different applications. The PL-T NIL machine is a desktop multi-functional system designed for universities and research laboratories. It is versatile for all forms of imprint: thermal, photocurable, and embossing. The substrate size can be as large as 4 inches. The pattern size <5nm using the soft NIL molds (or templates) can be achieved by our patented technology. The light weight of the system, user friendly operation and high performance are favored greatly by almost all the users.

 


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